wet-chemical etching

The silicon chip of dual-E form non-integral structure has been introduced, which is prepared by the technique of anisotropic wet etching of silicon and the sensor of pressure sealed and packaged based on this chip.

介绍利用硅的各向异性腐蚀工艺腐蚀出的一种双E形结构非整体结构弹性膜硅芯片及用此芯片封装成的压力敏感元件。

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Wet etching of dry thermal SiO_2 with buffered hydrofluoride acid

干氧SiO2的氢氟酸缓冲腐蚀研究

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New method using electrodes in laser induced wet etching

激光诱导液相电极腐蚀新方法

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Study of Infrared Thermal Image in Process of Wet Etching

湿法腐蚀进程的红外热像学研究

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And then, photolithography and wet etching were used to pattern the ITO films for electrical measurement, which involved the measurement of temperature coefficient of resistance and the gauge factor.

然后用光刻和刻蚀的方法制作电学测试所需的图形。对于ITO薄膜的电学测试包括对其电阻温度系数和响应因子的测量两部分。

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